WEKO3
インデックスリンク
アイテム
Characterization of pH-Responsible Polymer Nano-Film Synthesized on Self-Assembled Phospholipid Layer Fabricated by Plasma-Assisted Method
https://gifu-pu.repo.nii.ac.jp/records/14092
https://gifu-pu.repo.nii.ac.jp/records/14092d42d3bb0-fd36-477c-b173-07c5544e9acc
Item type | 研究室原著論文(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2020-09-10 | |||||
タイトル | ||||||
タイトル | Characterization of pH-Responsible Polymer Nano-Film Synthesized on Self-Assembled Phospholipid Layer Fabricated by Plasma-Assisted Method | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Polymer nano-film | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | pH-responsible | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Plasma irradiation | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Self-assembled phospholipid layer | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Cyclodextrin | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
抄録 | ||||||
値 | We fabricated the pH-responsible polymer nano-film possessing carbamate groups, which were easily decomposed in acidic condition, in the linker moieties. In pH 7.4 phosphate buffer saline the number average diameter of pH-responsible polymer nano-film was about 350 nm and its size distribution had almost unchanged for 3 days. In pH 5.0 acetate buffer solution the scattering intensity of polymer nano-film in DLS measurement gradually decreased and it was difficult to measure the particle diameter of polymer nano-film after 15 h due to the lower scattering intensity. It was suggested that most of the polymer nano-film might be decomposed until 15 h. |
|||||
書誌情報 |
en : Journal of Photopolymer Science and Technology 巻 33, 号 3, p. 333-336, 発行日 2020-07-01 |
|||||
DOI | ||||||
値 | 10.2494/photopolymer.33.333 |